Evaluation of photolitographic properties of functional groups containing polystyrenes

In this study, different molecular weighted PSs were chemically modified by two functional modifiers (maleic anhydride (MA) and acetic anhydride (AA)) under optimum reaction conditions with BF3O(C2H5)2 catalyst and the bonding of active functional groups (MAPS: -CO – CH = CH-COOH and AAPS: –CO-CH3) to the aromatic ring of the polymer was carried out. Depending on the structure of the carboxyl and acetyl groups attached to the aromatic ring, the photolithographic properties were examined by solubility and FT-IR analysis, also the effect of borneol, which is used as a sensitizer-activator, on photolithographic properties was investigated. As a result, the optimum reaction conditions was found to be as PS: modifier mole ratio 1: 0.2; modifier: catalyst molar ratio 1: 1 and it was determined that more functional groups were attached to the structure of lower molecular weighted PS. It was determined that modified PSs dissolved less in toluene than virgin PS (70.04% and 85.48% respectively). In dissolution tests performed after irradiation, the best value was obtained from MAPS (54.51%), while there was no significant change in the dissolution values of AAPS (83.46%). However the solubility value of MAPS decreased to 49.67% with the irradiation process performed after the addition of borneol substance but there was no significant change in the solubility values of AAPS (84.50%). In addition, it was observed that the dissolution values decreased depending on the irradiation time in MAPS, but it was not observed in AAPS. The decrease in dissolution of MAPS after UV irradiation has proven that MAPSs are light sensitive and they are negative photoresists that crosslinked by light effect. It was observed that the borneol also supports the photoresist feature. Although AAPS gives lower dissolution values than virgin PS but no significant change was observed in dissolution values after UV-irradiation and it was determined that AAPS did not present photoresist properties.

Fonksiyonel gruplu polistirenlerin fotolitografik özelliklerinin incelenmesi

Bu çalýþmada farklý molekül kütleli PS’lerin fonksiyonel modifikatörlerle (maleik anhidrit (MA) ve asetik anhidrit (AA)), BF3O(C2H5)2 katalizörlüðünde optimum reaksiyon þartlarýnda kimyasal modifikasyonu yapýlmýþ ve aromatik halkasýna aktif fonksiyonel gruplar (MAPS: -CO–CH=CH-COOH ve AAPS: –CO-CH3) baðlanmýþtýr. Sentezlenen modifiye PS’lere baðlanan karboksil ve asetil gruplarýn yapýsýna baðlý olarak fotolitografik özellikleri, çözünürlük tayini ve FT-IR analizi ile incelenmiþ ayrýca sensibilizatör-aktivatör borneol maddesinin fotolitografik özellikler üzerindeki etkisi araþtýrýlmýþtýr. Sonuçta optimum reaksiyon þartlarý PS: modifikatör mol oraný 1: 0,2; modifikatör: katalizör mol oraný 1: 1 olarak bulunmuþ ve düþük molekül aðýrlýklý PS’lerin yapýsýna daha fazla fonksiyonel grup baðlandýðý tespit edilmiþtir. Modifiye PS’lerin toluende PS’ye göre daha az çözündüðü (sýrasýyla %70,04 ve %85,48) tesbit edilmiþtir. Iþýnlamadan sonra yapýlan çözünürlük testlerinde en iyi deðer %54,51 ile MAPS’den elde edilirken AAPS’nin çözünürlük deðerlerinde dikkate deðer bir deðiþim olmamýþtýr (%83,46). Borneol maddesinin ilavesinden sonra yapýlan ýþýnlama iþlemiyle MAPS’nin çözünürlük deðeri %49,67’ye kadar düþerken, AAPS’nin çözünürlük deðerlerinde önemli bir deðiþim olmamýþtýr (%84,50). Ayrýca MAPS’lerde ýþýnlama süresine baðlý olarak çözünürlük deðerlerinde azalma gözlemlenirken bu durum AAPS’lerde görülmemiþtir. UV ýþýnlama sonrasýnda MAPS’lerin çözünürlüðündeki azalma MAPS’lerin ýþýða duyarlýlýk özelliði gösterdiðini ve ýþýnlama etkisiyle çapraz baðlanma yeteneðine sahip negatif fotorezist olduðunu göstermiþtir. Borneol’ün de fotorezist özelliði desteklediði görülmüþtür. AAPS’ler ise PS’ye göre daha düþük çözünürlük deðerleri vermesine karþýn UV-ýþýnlamadan sonra çözünürlük deðerlerinde dikkate deðer bir deðiþiklik görülmemiþ ve AAPS’lerin fotorezist özellik göstermediði belirlenmiþtir.